The device for improvement of quality of optical laser systems by their dynamic adjustment on a minimum of optical distortions (focus), including atmospheric turbulence, thermal distortions etc. in a mode of real time.
Areas of application: laser processing of materials by industrial technological lasers, optics of the high sanction etc.
Is intended for use in optical laser systems with capacity up to 1 kw and provides the increased deformations of a reflecting surface.
- High quality and reliability
- High sensitivity
- Small electromechanical hysteresis
- Wide area of frequencies
- Simplicity of operation, management and service
- Opportunity of computer and manual control
Dimensional drawing of the mirror
||Cu, Au, another on demand of the customer|
||Al2O3, another on demand of the customer|
|Light aperture diameter
|Number of control channels
||1, on demand of the customer can be increased|
||-200 ... +300 V|
|Sensitivity, no less, microns/kV
||50 with 1 control channel|
|Capacity of falling radiation, no more, kw
||See the dimensional drawing|
|Weight, no more, kg
The interferogram of surface of a mirror AT22 at voltage +20 V.